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Chemical mechanical planarization polisher market to drop 9.7% in 2005

Applied Materials and Cabot Microelectronics continued its dominance of the CMP (Chemical Mechanical Planarization) market for semiconductor applications in 2004, according to The Information Network. Applied Materials was the only equipment company that grew year-over-year in the CMP market in 2004.

Applied Materials and Cabot Microelectronics continued its dominance of the CMP (Chemical Mechanical Planarization) market for semiconductor applications in 2004, according to The Information Network. Applied Materials was the only equipment company that grew year-over-year in the CMP market in 2004. The company increased its market share from 67.8% in 2003 to 73.8% in 2004. Ebara was next with a 20.6% share. The Information Network projects the CMP polisher market to drop 9.7% in 2005 following an 87% growth in 2004. In the CMP slurry sector, Cabot Microelectronics maintained its market dominance with a 53.2% share. Rohm and Haas was next with a 13.5% share.